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Nøkkelord: lithography [142 articles]

Nye artikler klassifisert med nøkkelordet lithography.
  • Recent progress in quantum and nonlinear optical lithography
    Journal of Modern Optics, Vol. 53, No. 5-6. (April 2006), pp. 713-718.
    by Robert W Boyd, Sean J Bentley
    posted to lithography by tapnews on 2007-11-12 19:52:14 as **
  • Imaging interferometric lithography for arbitrary patterns
    Vol. 3331 (June 1998), pp. 214-224.
    by X Chen, SR Brueck
    edited by Y Vladimirsky
    posted to imaging interference interferometry lithography patterns photolithography by rodney on 2007-09-05 00:10:27 as ** along with 1 group Kopelman_Group
  • Natural lithography
    Applied Physics Letters, Vol. 41, No. 4. (1982), pp. 377-379.
    by HW Deckman, JH Dunsmuir
    posted to fabrication lithography monolayer nanosphere by rodney on 2007-08-06 03:52:09 as ** along with 1 person and 1 group ijbuss Kopelman_Group
  • Generation of subquarter-micron resist structures using optical interference lithography and image reversal
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.1949-1953, Vol. 15 (November 1997), pp. 1949-1953.
    by JY Decker, A Fernandez, DW Sweeney
    posted to fabrication holography image interference lithography optical photolithography photoresist resist reversal submicron by rodney on 2007-09-05 00:08:46 as ** along with 1 group Kopelman_Group
  • Methods for fabricating arrays of holes using interference lithography
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.2439-2443, Vol. 15 (November 1997), pp. 2439-2443.
    by A Fernandez, JY Decker, SM Herman, DW Phillion, DW Sweeney, MD Perry
    posted to arrays fabrication holes holography interference lithography photolithography by rodney on 2007-09-05 00:07:32 as ** along with 1 group Kopelman_Group
  • Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 3, May 1997, pp.729-735, Vol. 15 (May 1997), pp. 729-735.
    by A Fernandez, HT Nguyen, JA Britten, RD Boyd, MD Perry, DR Kania, AM Hawryluk
    posted to arrays displays emission fabrication fed field flat holography interference lithography panel pattern photoresist resist submicron by rodney on 2007-09-05 00:06:03 as ** along with 1 group Kopelman_Group
  • Large-area achromatic interferometric lithography for 100 nm period gratings and grids
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 6, November 1996, pp.4167-4170, Vol. 14 (November 1996), pp. 4167-4170.
    by TA Savas, ML Schattenburg, JM Carter, HI Smith
    posted to achromatic fabrication gratings grids interference interferometry large-field lithography photolithography submicron by rodney on 2007-09-05 00:04:27 as ** along with 1 group Kopelman_Group
  • Interferometric lithography of sub-micrometer sparse hole arrays for field-emission display applications
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 5, September 1996, pp.3339-3349, Vol. 14 (September 1996), pp. 3339-3349.
    by X Chen, SH Zaidi, SRJ Brueck, DJ Devine
    posted to arrays display emission fabrication fed field hole holography interference interferometry lithography photolithography submicron by rodney on 2007-09-05 00:02:40 as ** along with 1 group Kopelman_Group
  • Rapid communication Fabrication of nano-dot- and nano-ring-arrays by nanosphere lithography
    Applied Physics A: Materials Science & Processing, Vol. 63 (1996), pp. 617-619.
    by M Winzer, M Kleiber, N Dix, R Wiesendanger
    posted to arrays fabrication lithography monolayer nano-dot nanoparticles nano-ring nanosphere by rodney on 2007-08-02 22:18:08 as ** along with 1 person and 1 group xxxxxxxxxxx Kopelman_Group
  • Fabrication of sub-0.5 micron diameter cobalt dots on silicon substrates and photoresist pedestals on 50 cm × 50 cm glass substrates using laser interference lithograph
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 3, May 1996, pp.2005-2007, Vol. 14 (May 1996), pp. 2005-2007.
    by JP Spallas, RD Boyd, JA Britten, A Fernandez, AM Hawryluk, MD Perry, DR Kania
    posted to array cobalt dots fabrication glass holography interference large-field lithography pedestals photolithography photoresist resist silicon submicron substrates by rodney on 2007-09-05 00:00:08 as ** along with 1 group Kopelman_Group
  • Optically matched trilevel resist process for nanostructure fabrication
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.3007-3011, Vol. 13 (November 1995), pp. 3007-3011.
    by ML Schattenburg, RJ Aucoin, RC Fleming
    posted to fabrication gratings interference lithography matched nanostructures optical photolithography photoresist resist trilevel by rodney on 2007-09-04 23:58:03 as ** along with 1 group Kopelman_Group
  • Achromatic interferometric lithography for 100-nm-period gratings and grids
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.2732-2735, Vol. 13 (November 1995), pp. 2732-2735.
    by TA Savas, SN Shah, ML Schattenburg, JM Carter, HI Smith
    posted to achromatic gratings grids holography interference interferometry lithography photolithography submicron by rodney on 2007-09-04 23:56:25 as ** along with 1 group Kopelman_Group
  • Field emitter array mask patterning using laser interference lithography
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 5, September 1995, pp.1973-1978, Vol. 13 (September 1995), pp. 1973-1978.
    by JP Spallas, AM Hawryluk, DR Kania
    posted to array emitter field holography interference lithography mask pattern photolithography by rodney on 2007-09-04 23:54:55 as ** along with 1 group Kopelman_Group
  • Multiple-exposure interferometric lithography
    Vol. 2197 (May 1994), pp. 869-875.
    by SH Zaidi, SR Brueck
    edited by TA Brunner
    posted to exposure holography interference interferometry lithography multiple photolithography by rodney on 2007-09-04 23:47:22 as ** along with 1 group Kopelman_Group
  • Developed profile of holographically exposed photoresist gratings
    Appl. Opt., Vol. 34, No. 4. (1 February 1995), pp. 597-603.
    by De, Ivan F da Costa, Carlos R Lima, Lucila Cescato
    posted to profile photoresist lithography holographic gratings development by rodney on 2008-07-27 22:45:08 as **
  • Biomolecular recognition using submicron laser lithography
    Applied Physics Letters, Vol. 73, No. 3. (1998), pp. 417-419.
    by GV Shivashankar, A Libchaber
    posted to laser lithography optical by rodney on 2007-07-26 05:19:33 as ** along with 1 group Kopelman_Group
  • Multiple-level phase gratings fabricated using focused ion-beam milling and electron-beam lithography
    The 38th international symposium on electron, ion, and photon beams, Vol. 12, No. 6. (1994), pp. 3643-3647.
    by SM Shank, FT Chen, M Skvarla, HG Craighead, P Cook, R Bussjager, F Haas, DA Honey
    posted to phase lithography ion-beam gratings fabrication e-beam diffraction by rodney on 2008-07-27 22:22:05 as **
  • Tracking Single Molecular Diffusion on Glass Substrate Modified with Periodic Ag Nano-architecture
    Japanese Journal of Applied Physics, Vol. 45 (July 2006), 6039.
    by B Takimoto, H Nabika, K Murakoshi
    posted to diffusion glass lithography molecule nanoprisms nanosphere nanostructures periodic silver single tracking by rodney on 2007-08-01 02:17:38 as read along with 1 group Kopelman_Group
  • Flow of a Viscous Liquid on a Rotating Disk
    Journal of Applied Physics, Vol. 29, No. 5. (1958), pp. 858-862.
    by Alfred G Emslie, Francis T Bonner, Leslie G Peck
    posted to viscosity rotation photolithography lithography flow disk by rodney on 2008-07-27 22:00:40 as read
  • Sub-0.1 micron patterning with high aspect ratio of 5 achieved by preventing pattern collapse
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 35, No. 4 A. (1996), pp. 2385-2386.
    by Y Yamashita
    posted to aspect-ratio collapse fabrication lithography pattern photolithography submicron by rodney on 2007-09-03 21:36:31 as ** along with 1 group Kopelman_Group
  • Surface adhesion reduction in silicon microstructures using femtosecond laser pulses
    Applied Physics Letters, Vol. 68 (January 1996), pp. 197-199.
    by NC Tien, S Jeong, LM Phinney, K Fushinobu, J Bokor
    posted to adhesion fabrication femtosecond laser lithography microstructures photolithography pulses silicon surface by rodney on 2007-09-03 21:33:42 as ** along with 1 group Kopelman_Group
  • Scaling behavior in interference lithography
    Emerging Lithographic Technologies II, Vol. 3331, No. 1. (1998), pp. 662-672.
    by Rodney R Agayan, William C Banyai, Andres J Fernandez
    edited by Yuli Vladimirsky
    posted to diffraction grating interference lithography optical by rodney on 2007-03-03 22:45:08 as read along with 1 group Kopelman_Group
  • Dry development of photosensitive polyimides for high resolution and aspect ratio applications
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.2179-2183, Vol. 13 (November 1995), pp. 2179-2183.
    by J Muñoz, C Dom\ínguez
    posted to aspect-ratio development dry fabrication high lithography photolithography photoresist photosensitive polyimides resist resolution by rodney on 2007-09-03 21:32:10 as ** along with 1 group Kopelman_Group
  • Dry development of sub-0.25 mu m features patterned with 193 nm silylation resist
    The 42nd national symposium of the American Vacuum Society, Vol. 14, No. 3. (1996), pp. 1132-1136.
    by SC Palmateer, AR Forte, RR Kunz, MW Horn
    posted to 193nm development dry fabrication lithography pattern photolithography photoresist resist silylation submicron by rodney on 2007-09-03 21:29:55 as ** along with 1 group Kopelman_Group
  • Effect of low-solubility surface layer on development of AZ-PF514
    Proceedings of the 16th international symposium on electron, ion, and photon beams, Vol. 11, No. 6. (1993), pp. 2829-2833.
    by Azalia A Krasnoperova, Stephen W Turner, Leo Ocola, Franco Cerrina
    posted to az-pf514 development fabrication lithography low-solubility photolithography photoresist resist surface by rodney on 2007-09-03 21:27:29 as ** along with 1 group Kopelman_Group
  • Photoresist-Assisted Release of Movable Microstructures
    Japanese Journal of Applied Physics, Vol. 32 (November 1993), pp. L1642-L1644.
    by D Kobayashi, CJ Kim, H Fujita
    posted to fabrication lithography microstructures movable photolithography photoresist resist by rodney on 2007-09-03 21:25:33 as ** along with 1 group Kopelman_Group
  • Profile control in dry development of high-aspect-ratio resist structures
    The 38th International symposium on electron, ion, and photon beams, Vol. 13, No. 6. (1995), pp. 3017-3021.
    by MB Stern, SC Palmateer, MW Horn, M Rothschild, BE Maxwell, JE Curtin
    posted to aspect-ratio development dry fabrication lithography photolithography photoresist profile resist by rodney on 2007-09-03 21:22:33 as ** along with 1 group Kopelman_Group
  • Process-specific tuning of lithography simulation tools
    Vol. 3051 (July 1997), pp. 491-498.
    by ME Mason, RA Soper, RM Terry, CA Mack
    edited by GE Fuller
    posted to development fabrication finle gratings lithography parameters photolithography prolith2 simulation by rodney on 2007-09-05 20:58:02 as ** along with 1 group Kopelman_Group
  • Surface tension, adhesion and wetting of materials for photolithographic process
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 14, No. 4. (1996), pp. 2485-2492.
    by J Bauer, G Drescher, M Illig
    posted to adhesion angle collapse contact fabrication lithography photolithography surface tension wetting by rodney on 2007-09-03 21:15:12 as ** along with 1 person and 1 group carygallen Kopelman_Group
  • Lithography model tuning: matching simulation to experiment
    Vol. 2726 (June 1996), pp. 223-235.
    by SH Thornton, CA Mack
    edited by GE Fuller
    posted to development dose experiment exposure fabrication finle gratings lithography parameters photolithography photoresist prolith2 resist simulation thickness by rodney on 2007-09-05 20:55:15 as ** along with 1 group Kopelman_Group
  • Adhesion of Resist Micropatterns during Drying after Water Rinse
    Japanese Journal of Applied Physics, Vol. 34 (August 1995), pp. L1093-L1094.
    by A Kawai
    posted to adhesion collapse drying fabrication lithography pattern photolithography photoresist resist rinse water by rodney on 2007-09-03 21:14:01 as ** along with 1 group Kopelman_Group
  • Dimensional limitations of silicon nanolines resulting from pattern distortion due to surface tension of rinse water
    Applied Physics Letters, Vol. 66, No. 20. (1995), pp. 2655-2657.
    by Hideo Namatsu, Kenji Kurihara, Masao Nagase, Kazumi Iwadate, Katsumi Murase
    posted to collapse fabrication grating lithography nanolines pattern photolithography rinse silicon surface tension water by rodney on 2007-09-03 21:12:31 as ** along with 1 group Kopelman_Group
  • Calibration and validation of projection lithography focusing by fluorescence detection of latent photoacid images in chemically amplified resist
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 20, Issue 1, January 2002, pp.164-166, Vol. 20 (January 2002), pp. 164-166.
    by GD Feke, RD Grober, G Pohlers, JF Cameron
    posted to amplified calibration chemically detection fluorescence focus latent lithography photoacid photoresist projection resist by rodney on 2007-08-16 02:34:03 as ** along with 1 group Kopelman_Group
  • Mechanism of Resist Pattern Collapse during Development Process
    Japanese Journal of Applied Physics, Vol. 32 (December 1993), 6059.
    by T Tanaka, M Morigami, N Atoda
    posted to collapse development fabrication lithography pattern photolithography photoresist resist by rodney on 2007-09-03 21:10:45 as ** along with 1 group Kopelman_Group
  • Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process
    Japanese Journal of Applied Physics, Vol. 33 (December 1994), pp. L1803-L1805.
    by T Tanaka, M Morigami, H Oizumi, T Ogawa, Uchino
    posted to collapse exposure fabrication flood lithography pattern photolithography photoresist resist rinse by rodney on 2007-09-03 21:08:43 as ** along with 1 group Kopelman_Group
  • Patterning characteristics of a chemically-amplified negative resist in synchrotron radiation lithography
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 31, No. 9 A. (1992), pp. 2954-2958.
    by Kimiyoshi Deguchi, Kazunori Miyoshi, Tetsuyoshi Ishii, Tadahito Matsuda
    posted to amplified chemically collapse fabrication lithography negative pattern photolithography photoresist radiation resist synchotron by rodney on 2007-09-03 21:07:00 as ** along with 1 group Kopelman_Group
  • Maskless photolithography using UV LEDs
    Lab Chip (2008)
    by Rosanne M Guijt, Michael C Breadmore
    posted to lithography by rafagomez on 2008-07-18 05:29:01 as ****
  • Design, Realization, and Characterization of 3-D Taper for Fiber/Micro-Waveguide Coupling
    Selected Topics in Quantum Electronics, IEEE Journal of, Vol. 12, No. 6. (2006), pp. 1354-1358.
    by L Vivien, XL Roux, S Laval, E Cassan, D Marris-Morini
    posted to edge_coupling electron_beam experiment fiber_optics lithography optics processing sabio_group_papers silicon silicon_oxide waveguide by kristgy on 2007-05-10 17:31:10 as **
  • The SOI planar photonic crystal fabrication: patterning of Cr using Cl2/O2 plasma etching
    Microelectronic Engineering, Vol. 77, No. 2. (February 2005), pp. 139-143.
    by AP Milenin, C Jamois, RB Wehrspohn, M Reiche
    posted to chromium electron_beam etching etch_rates lithography pmma by kristgy on 2007-10-09 20:43:19 as **
  • New high resolution and high sensitivity deep UV, x-ray, and electron beam resists
    Microelectronic Engineering, Vol. 11, No. 1-4. (April 1990), pp. 487-489.
    by Michael Hatzakis, Kevin J Stewart, Jane M Shaw, Stephen A Rishton
    posted to electron_beam hardcopy lithography su-8 by kristgy on 2006-08-25 16:48:58 as **
  • Nanoimprint Lithography: Methods and Material Requirements
    Advanced Materials, Vol. 19, No. 4. (2007), pp. 495-513.
    by L J Guo
    posted to hardcopy lithography nanoimprint polymeric processing review by kristgy on 2007-10-12 15:40:14 as ** along with 1 person kchou
  • Polymer stamps for nanoimprinting
    Microelectronic Engineering, Vol. 61-62 (July 2002), pp. 393-398.
    by K Pfeiffer, M Fink, G Ahrens, G Gruetzner, F Reuther, J Seekamp, S Zankovych, Sotomayor, I Maximov, M Beck, M Graczyk, L Montelius, H Schulz, Scheer, F Steingrueber
    posted to electron_beam imprint lithography su-8 by kristgy on 2007-10-30 12:23:50 as **
  • notes The discovery and development of onium salt cationic photoinitiators
    Journal of Polymer Science Part A: Polymer Chemistry, Vol. 37, No. 23. (1999), pp. 4241-4254.
    by James V Crivello
    posted to lithography su-8 by kristgy on 2006-08-25 15:49:07 as **
  • Comparison of high resolution negative electron beam resists
    Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 24, No. 4. (2006), pp. 1776-1779.
    by B Bilenberg, M Scholer, P Shi, MS Schmidt, P Boggild, M Fink, C Schuster, F Reuther, C Gruetzner, A Kristensen
    posted to electron_beam hardcopy lithography processing su-8 by kristgy on 2006-09-07 09:48:59 as read
  • Single mode solid state distributed feedback dye laser fabricated by gray scale electron beam lithography on a dye doped SU-8 resist
    Journal of Micromechanics and Microengineering, Vol. 15, No. 12. (December 2005), pp. 2456-2460.
    by S Balslev, T Rasmussen, P Shi, A Kristensen
    posted to dye electron_beam laser lithography optics su-8 by kristgy on 2006-06-12 17:01:01 as **
  • One-step lithography for various size patterns with a hybrid mask-mold
    Microelectronic Engineering, Vol. 71, No. 3-4. (May 2004), pp. 288-293.
    by Xing Cheng, Jay
    posted to lithography nanoimprint by kristgy on 2007-09-14 09:21:51 as **
  • Optofluidic third order distributed feedback dye laser
    Applied Physics Letters, Vol. 89, No. 10. (2006)
    by Morten Gersborg-Hansen, Anders Kristensen
    posted to dye electron_beam lab-on-a-chip laser lithography pmma polymeric su-8 by kristgy on 2006-10-24 22:40:15 as read
  • Integrated optics components and devices using periodic structures
    Quantum Electronics, IEEE Journal of, Vol. 22, No. 6. (1986), pp. 845-867.
    by T Suhara, H Nishihara
    posted to 100_citations electron_beam grating_coupler lithography optics review theory by kristgy on 2007-11-07 15:21:59 as ****
  • Integration of active and passive polymer optics
    Opt. Express, Vol. 15, No. 7. (2 April 2007), pp. 3931-3939.
    by Mads B Christiansen, Mikkel Schøler, Anders Kristensen
    posted to cavity_resonator dye hardcopy laser lithography nanoimprint polymeric processing su-8 by kristgy on 2007-10-12 14:47:05 as read
  • Performance of the Raith 150 electron-beam lithography system
    The 45th international conference on electron, ion, and photon beam technology and nanofabrication, Vol. 19, No. 6. (2001), pp. 2499-2503.
    by James G Goodberlet, Todd J Hastings, Henry I Smith
    posted to electron_beam lithography processing raith by kristgy on 2006-08-25 09:50:25 as **
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