Investigation of space filling capacitors

by: T Moselhy, H Ghali, HF Ragaie, H Haddara

Microelectronics, 2003. ICM 2003. Proceedings of the 15th International Conference on (2003), pp. 287-290.

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Abstract

This paper investigates the usage of the family of space filling curves in capacitor design. Some of the known family members are studied regarding their applications as area efficient capacitor elements. One of the main advantages of these structures is that they divide the space into two continuous electrodes. This makes extra connecting vias and metal layers unnecessary, and enables implementation on a single metal layer. The capacitance of the suggested structures are obtained and compared with some of the reference structures such as the interdigitated and woven capacitors.

@inproceedings{citeulike:2060669, abstract = {This paper investigates the usage of the family of space filling curves in capacitor design. Some of the known family members are studied regarding their applications as area efficient capacitor elements. One of the main advantages of these structures is that they divide the space into two continuous electrodes. This makes extra connecting vias and metal layers unnecessary, and enables implementation on a single metal layer. The capacitance of the suggested structures are obtained and compared with some of the reference structures such as the interdigitated and woven capacitors.}, author = {Moselhy, T. and Ghali, H. and Ragaie, H. F. and Haddara, H. }, booktitle = {Microelectronics, 2003. ICM 2003. Proceedings of the 15th International Conference on}, citeulike-article-id = {2060669}, journal = {Microelectronics, 2003. ICM 2003. Proceedings of the 15th International Conference on}, keywords = {capacitor, fractal}, pages = {287--290}, posted-at = {2007-12-05 11:59:42}, priority = {2}, title = {Investigation of space filling capacitors}, url = {http://ieeexplore.ieee.org/xpls/abs\_all.jsp?arnumber=1287807}, year = {2003} }

RIS record

TY - CONF ID - citeulike:2060669 L3 - citeulike-article-id:2060669 TI - Investigation of space filling capacitors T2 - Microelectronics, 2003. ICM 2003. Proceedings of the 15th International Conference on JF - Microelectronics, 2003. ICM 2003. Proceedings of the 15th International Conference on SP - 287 EP - 290 N2 - This paper investigates the usage of the family of space filling curves in capacitor design. Some of the known family members are studied regarding their applications as area efficient capacitor elements. One of the main advantages of these structures is that they divide the space into two continuous electrodes. This makes extra connecting vias and metal layers unnecessary, and enables implementation on a single metal layer. The capacitance of the suggested structures are obtained and compared with some of the reference structures such as the interdigitated and woven capacitors. KW - capacitor KW - fractal AU - Moselhy, T AU - Ghali, H AU - Ragaie, HF AU - Haddara, H PY - 2003/// UR - http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=1287807 ER -

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