Registrer deg | Logg på | FAQ      [?] 
CiteULike is a free online bibliography manager. Register and you can start organising your references online.
Recent | Unread | Search | Authors | Tags | Export

Atomistic modeling of the effects of dose and implant temperature on dopant diffusion and amorphization in Si

by: Lourdes Pelaz, Luis A Marques, George H Gilmer, Martin Jaraiz, Juan Barbolla
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Vol. 180, No. 1-4. (June 2001), pp. 12-16.

View FullText article


X Reviews [Write a review of this article]

There are no reviews of this article

X Find related articles from these CiteULike users

X Find related articles with these CiteULike tags

X BibTeX record

X RIS record



RIS BibTeX
CiteULike organises scholarly (or academic) papers or literature and provides bibliographic (which means it makes bibliographies) for universities and higher education establishments. It helps undergraduates and postgraduates. People studying for PhDs or in postdoctoral (postdoc) positions. The service is similar in scope to EndNote or RefWorks or any other reference manager like BibTeX, but it is a social bookmarking service for scientists and humanities researchers.