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rodneys photoresist [22 articles]

Artikler nylig sendt til rodneys bibliotek klassifisert med nøkkelordet photoresist. You can also see everyone's photoresist.
  • Diffraction efficiency of photorefractive index gratings
    Optics Communications, Vol. 125, No. 1-3. (1 April 1996), pp. 101-104.
    by Ru Guo, Zhengfang Ling
    posted to diffraction gratings index photoresist by rodney on 2008-07-27 23:54:40 as **
  • In situ end-point detection during development of submicrometer grating structures in photoresist
    Optical Engineering, Vol. 34, No. 2. (1995), pp. 474-479.
    by Jerald A Britten, Robert D Boyd, Bruce W Shore
    posted to detection development diffraction grating in photoresist processing situ submicron by rodney on 2008-07-27 23:10:35 as **
  • Developed profile of holographically exposed photoresist gratings
    Appl. Opt., Vol. 34, No. 4. (1 February 1995), pp. 597-603.
    by De, Ivan F da Costa, Carlos R Lima, Lucila Cescato
    posted to development gratings holographic lithography photoresist profile by rodney on 2008-07-27 22:45:08 as **
  • Lithography model tuning: matching simulation to experiment
    Vol. 2726 (June 1996), pp. 223-235.
    by SH Thornton, CA Mack
    edited by GE Fuller
    posted to development dose experiment exposure fabrication finle gratings lithography parameters photolithography photoresist prolith2 resist simulation thickness by rodney on 2007-09-05 20:55:15 as ** along with 1 group Kopelman_Group
  • Generation of subquarter-micron resist structures using optical interference lithography and image reversal
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 6, November 1997, pp.1949-1953, Vol. 15 (November 1997), pp. 1949-1953.
    by JY Decker, A Fernandez, DW Sweeney
    posted to fabrication holography image interference lithography optical photolithography photoresist resist reversal submicron by rodney on 2007-09-05 00:08:46 as ** along with 1 group Kopelman_Group
  • Use of interference lithography to pattern arrays of submicron resist structures for field emission flat panel displays
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 15, Issue 3, May 1997, pp.729-735, Vol. 15 (May 1997), pp. 729-735.
    by A Fernandez, HT Nguyen, JA Britten, RD Boyd, MD Perry, DR Kania, AM Hawryluk
    posted to arrays displays emission fabrication fed field flat holography interference lithography panel pattern photoresist resist submicron by rodney on 2007-09-05 00:06:03 as ** along with 1 group Kopelman_Group
  • Fabrication of sub-0.5 micron diameter cobalt dots on silicon substrates and photoresist pedestals on 50 cm × 50 cm glass substrates using laser interference lithograph
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 14, Issue 3, May 1996, pp.2005-2007, Vol. 14 (May 1996), pp. 2005-2007.
    by JP Spallas, RD Boyd, JA Britten, A Fernandez, AM Hawryluk, MD Perry, DR Kania
    posted to array cobalt dots fabrication glass holography interference large-field lithography pedestals photolithography photoresist resist silicon submicron substrates by rodney on 2007-09-05 00:00:08 as ** along with 1 group Kopelman_Group
  • Optically matched trilevel resist process for nanostructure fabrication
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.3007-3011, Vol. 13 (November 1995), pp. 3007-3011.
    by ML Schattenburg, RJ Aucoin, RC Fleming
    posted to fabrication gratings interference lithography matched nanostructures optical photolithography photoresist resist trilevel by rodney on 2007-09-04 23:58:03 as ** along with 1 group Kopelman_Group
  • Freeze-Drying Process to Avoid Resist Pattern Collapse
    Japanese Journal of Applied Physics, Vol. 32 (December 1993), 5813.
    by T Tanaka, M Morigami, H Oizumi, T Ogawa
    posted to collapse fabrication freeze-drying pattern photoresist resist by rodney on 2007-09-04 01:53:04 as ** along with 1 group Kopelman_Group
  • Dry development of photosensitive polyimides for high resolution and aspect ratio applications
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 13, Issue 6, November 1995, pp.2179-2183, Vol. 13 (November 1995), pp. 2179-2183.
    by J Muñoz, C Dom\ínguez
    posted to aspect-ratio development dry fabrication high lithography photolithography photoresist photosensitive polyimides resist resolution by rodney on 2007-09-03 21:32:10 as ** along with 1 group Kopelman_Group
  • Dry development of sub-0.25 mu m features patterned with 193 nm silylation resist
    The 42nd national symposium of the American Vacuum Society, Vol. 14, No. 3. (1996), pp. 1132-1136.
    by SC Palmateer, AR Forte, RR Kunz, MW Horn
    posted to 193nm development dry fabrication lithography pattern photolithography photoresist resist silylation submicron by rodney on 2007-09-03 21:29:55 as ** along with 1 group Kopelman_Group
  • Effect of low-solubility surface layer on development of AZ-PF514
    Proceedings of the 16th international symposium on electron, ion, and photon beams, Vol. 11, No. 6. (1993), pp. 2829-2833.
    by Azalia A Krasnoperova, Stephen W Turner, Leo Ocola, Franco Cerrina
    posted to az-pf514 development fabrication lithography low-solubility photolithography photoresist resist surface by rodney on 2007-09-03 21:27:29 as ** along with 1 group Kopelman_Group
  • Photoresist-Assisted Release of Movable Microstructures
    Japanese Journal of Applied Physics, Vol. 32 (November 1993), pp. L1642-L1644.
    by D Kobayashi, CJ Kim, H Fujita
    posted to fabrication lithography microstructures movable photolithography photoresist resist by rodney on 2007-09-03 21:25:33 as ** along with 1 group Kopelman_Group
  • Profile control in dry development of high-aspect-ratio resist structures
    The 38th International symposium on electron, ion, and photon beams, Vol. 13, No. 6. (1995), pp. 3017-3021.
    by MB Stern, SC Palmateer, MW Horn, M Rothschild, BE Maxwell, JE Curtin
    posted to aspect-ratio development dry fabrication lithography photolithography photoresist profile resist by rodney on 2007-09-03 21:22:33 as ** along with 1 group Kopelman_Group
  • Adhesion of Resist Micropatterns during Drying after Water Rinse
    Japanese Journal of Applied Physics, Vol. 34 (August 1995), pp. L1093-L1094.
    by A Kawai
    posted to adhesion collapse drying fabrication lithography pattern photolithography photoresist resist rinse water by rodney on 2007-09-03 21:14:01 as ** along with 1 group Kopelman_Group
  • Mechanism of Resist Pattern Collapse during Development Process
    Japanese Journal of Applied Physics, Vol. 32 (December 1993), 6059.
    by T Tanaka, M Morigami, N Atoda
    posted to collapse development fabrication lithography pattern photolithography photoresist resist by rodney on 2007-09-03 21:10:45 as ** along with 1 group Kopelman_Group
  • Prevention of Resist Pattern Collapse by Flood Exposure during Rinse Process
    Japanese Journal of Applied Physics, Vol. 33 (December 1994), pp. L1803-L1805.
    by T Tanaka, M Morigami, H Oizumi, T Ogawa, Uchino
    posted to collapse exposure fabrication flood lithography pattern photolithography photoresist resist rinse by rodney on 2007-09-03 21:08:43 as ** along with 1 group Kopelman_Group
  • Patterning characteristics of a chemically-amplified negative resist in synchrotron radiation lithography
    Jpn J Appl Phys Part 1 Regul Pap Short Note Rev Pap, Vol. 31, No. 9 A. (1992), pp. 2954-2958.
    by Kimiyoshi Deguchi, Kazunori Miyoshi, Tetsuyoshi Ishii, Tadahito Matsuda
    posted to amplified chemically collapse fabrication lithography negative pattern photolithography photoresist radiation resist synchotron by rodney on 2007-09-03 21:07:00 as ** along with 1 group Kopelman_Group
  • Calibration and validation of projection lithography focusing by fluorescence detection of latent photoacid images in chemically amplified resist
    Journal of Vacuum Science \amp Technology B: Microelectronics and Nanometer Structures, Volume 20, Issue 1, January 2002, pp.164-166, Vol. 20 (January 2002), pp. 164-166.
    by GD Feke, RD Grober, G Pohlers, JF Cameron
    posted to amplified calibration chemically detection fluorescence focus latent lithography photoacid photoresist projection resist by rodney on 2007-08-16 02:34:03 as ** along with 1 group Kopelman_Group
  • A study of the photochemical response of <I>o</I>-nitrobenzyl cholate derivatives in P(MMA-MAA) matrices
    Journal of Polymer Science: Polymer Chemistry Edition, Vol. 21, No. 4. (1983), pp. 1075-1083.
    by E Reichmanis, R Gooden, CW Wilkins, H Schonhorn
    posted to cholate matrix nitrobenzyl photochemical photolabile photoresist pmma by rodney on 2007-07-29 22:40:04 as * along with 1 group Kopelman_Group
  • Probing the Local pH of Polymer Photoresist Films Using a Two-Color Single Molecule Nanoprobe
    J Phys Chem B, Vol. 107, No. 51. (2003), pp. 14219-14224.
    by MD Mason, K Ray, G Pohlers, JF Cameron, RD Grober
    posted to color film films nanoparticles ph photoresist single-molecule two by rodney on 2007-03-22 16:30:59 as ** along with 1 group Kopelman_Group
  • Creating precise 3D microstructures using laser direct-write bimetallic thermal resist grayscale photomasks
    Proc SPIE Int Soc Opt Eng, Vol. 5713, pp. 247-258.
    by GH Chapman, J Dykes, D Poon, C Choo, J Wang, J Peng, Y Tu, J Fieret, PR Herman, T Okada, CB Arnold, FG Bachmann, W Hoving, K Washio, Y Lu, DB Geohegan
    posted to 3-d citedby grayscale laser masks metal microstructures photoresist resist thermal by rodney on 2007-03-08 23:47:37 as * along with 1 group Kopelman_Group
    • NB: Du kan sitere denne siden som: http://www.citeulike.org/user/rodney/tag/photoresist

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