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zamberdines Zimmerman [4 articles]

Nylige artikler sendt til zamberdines bibliotek av forfatteren Zimmerman. Du kan også see everyone s Zimmerman.
  • Rational Design of High-RI Resists for 193nm Immersion Lithography
    Journal of Photopolymer Science, Vol. 20, No. 5., pp. 665-671.
    by Andrew K Whittaker, Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu, Will Conley, Paul A Zimmerman
    posted to 193nm immersion resist by zamberdine on 2007-09-24 14:19:19 as **
  • High-RI resist polymers for 193 nm immersion lithography
    Advances in Resist Technology and Processing XXII, Vol. 5753, No. 1. (2005), pp. 827-835.
    by Andrew K Whittaker, Idriss Blakey, Heping Liu, David JT Hill, Graeme A George, Will Conley, Paul Zimmerman
    edited by John L Sturtevant
    posted to high qspr resists ri by zamberdine on 2007-09-24 14:11:17 as ***** along with 1 person kewms
  • Novel high-index resists for 193-nm immersion lithography and beyond
    Proceedings of SPIE, Vol. 6519 (2007)
    by Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu, Andrew Whittaker, Will Conley, Emil Piscani, Georgia Rich, Alvina Williams, Paul Zimmerman
    posted to 193 high immersion nm polymer ri by zamberdine on 2007-09-24 13:51:11 as *****
  • XPS and 19F NMR Study of the Photodegradation at 157 nm of Photolithographic-Grade Teflon AF Thi
    Macromolecules, Vol. 38, No. 10. (2005), pp. 4050-4053.
    by Idriss Blakey, Graeme A George, David JT Hill, Heping Liu, Firas Rasoul, Andrew K Whittaker, Paul Zimmerman
    posted to 157 af nm photodegradation teflon by zamberdine on 2007-09-24 12:50:31 as ****
    • NB: Du kan sitere denne siden som: http://www.citeulike.org/user/zamberdine/author/Zimmerman

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